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1991
Conference Paper
Title

Pure materials for media supply

Abstract
The requirements for the chemical and particulate cleanliness of process media in the area of semiconductor manufacturing will increase more and more in the future. Due to that fact elements around the media such as containers, pumps, valves, tubes and filters are of growing influence on the quality of the process fluid. This lecture will give a universal overall picture as well as attempts for future provision of even cleaner "hardware" for ultrapure media supply. This field stretches from the manufacturing of the materials (synthetic material or stainless steel) over the finishing process to isntallation in a supply system. It is the user who will more severely call for proof of quality in the future. For that reason everyone involved in the manufacturing process (starting from the manufacturing of materials until the assembly of the whole supply system) mudz fulfil his task with full responsibility.
Author(s)
Dorner, J.
Mainwork
Defect Control and Related Yield Management. Defects and impurities in materials, in process defect genetation, yield management, advanced testing methodologies  
Conference
Semicon Europa 1991  
Language
English
Fraunhofer-Institut für Produktionstechnik und Automatisierung IPA  
Keyword(s)
  • Fertigung

  • Halbleiter

  • Halbleiterfertigung

  • Höchstrein

  • Ultrapure media supply

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