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The properties of a-C-H films deposited by plasma decomposition of C2H2.

Eigenschaften von a-C-H Filmen, abgeschieden mittels Plasma Zerlegung von C2H2
: Zou, J.W.; Schmidt, K.; Reichelt, K.; Dischler, B.


Journal of applied physics 67 (1990), No.1, pp.487-494 : Abb.,Lit.
ISSN: 0021-8979
ISSN: 1089-7550
Journal Article
Fraunhofer IAF ()
amorph; amorphous; C2H2; carbon; Eigenschaft; Kohlenstoff; plasma; property

Diamondlike a-C:H films have been deposited by plasma decomposition of C sub 2 H sub 2 . 50 samples were prepared with a systematic variation of the parameters: the substrate bias voltage was between - 100 and - 1400 V and the C sub 2 H sub 2 gas pressure was between 4 x 10 high -4 and 2.6 x 10 high -1 mbar. The following properties of the films were measured: the density by Rutherford backscattering, the total concentration of hydrogen by elastic recoil detection, the bonding ratio sp high 3 / sp high 2 by infrared spectroscopy, the internal stress by the bending beam method, and the hardness with a Knoop microhardness tester. It has been shown that the hardness and other mechanical properties cannot be correlated to the average carbon coordination number m sub c. This is because m sub c is calculated under the assumption of a homogenous single-phase model, which does not seem to be justified. It is demonstrated that the mechanical properties can be explained by the application of a v oid model.