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Progress in high rate plasma activated PVD technology

 
: Schiller, S.

Third International Symposium on Sputtering and Plasma Processes. ISSP '95. Proceedings
1995
pp.79
International Symposium on Sputtering and Plasma Processes <3, 1995, Tokyo>
English
Conference Paper
Fraunhofer FEP ()

: http://publica.fraunhofer.de/documents/PX-29814.html