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Progress in high rate plasma activated PVD technology
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1995
Conference Paper
Titel
Progress in high rate plasma activated PVD technology
Author(s)
Schiller, S.
Hauptwerk
Third International Symposium on Sputtering and Plasma Processes. ISSP '95. Proceedings
Konferenz
International Symposium on Sputtering and Plasma Processes 1995
Language
English
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Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP