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Progress in high rate plasma activated PVD technology
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1995
Conference Paper
Title
Progress in high rate plasma activated PVD technology
Author(s)
Schiller, S.
Mainwork
Third International Symposium on Sputtering and Plasma Processes. ISSP '95. Proceedings
Conference
International Symposium on Sputtering and Plasma Processes 1995
Language
English
Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP
