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Procedure and results of mask fabrication via X-ray lithography

: Grimm, J.; Trube, J.; Huber, H.-L.


Microelectronic engineering 11 (1990), No.1-4, pp.275-280
ISSN: 0167-9317
International Conference on Microlithography: Microcircuit Engineering (ME) <15, 1989, Cambridge>
Conference Paper
Fraunhofer ISIT ()
masks; X-ray lithography

A copying procedure for reproduction of e-beam written X-ray masks has been developed and applied, for the fabrication of optically transparent stepper masks. This process uses normal X - ray lithography to expose an X-ray absorber pattern onto a resist-covered mask blank. In order to achieve high quality X-ray copies, it is necessary to use a copying instrument which avoids mask distortion or pattern displacements due to fixturing. Furthermore, efficient heat dissipation is required to prevent a rise in the temperature of the mask during X-ray exposure. Taking these conditions into account, X-ray copying is a significant mask fabrication technique providing special additional advantages.