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Preparation of W-C-H coatings by reactive magnetron sputtering

: Bewilogua, K.; Dimigen, H.

MacGuire, G.E.:
20th International Conference on Metallurgical Coatings and Thin Films 1993. Papers. Vol.1 : San Diego, CA, USA, April 19 - 23, 1993
Lausanne: Elsevier Sequoia, 1993 (Surface and coatings technology 61.1993,1/3)
International Conference on Metallurgical Coatings and Thin Films <20, 1993, San Diego/Calif.>
Conference Paper
Fraunhofer IST ()
dc magnetron; growth mechanism; mechanical property; metal hydrocarbon coating; plasma emission monitor; reactive sputtering; structure; tribological property

Metal containing amorphous hydrogenated carbon films (Me-C:H) with low metal contents (atomic ratios Me:C near 0. 1) exhibit a high wear resistance and also low friction coefficients against steel. The tribological behaviour of these Me-C:H coatings is rather similar to that of a-C:H. On the other hand the optimum tribological properties will be reached only in narrow interval of Me:C ratios (1). Therefore it is important to develop reproducible deposition processes having a long time stability without poisoning. For the W-C:H reactive dc- magnetron deposition (reactive gas acetylene) this could be realized using a Plasma Emission Monitor (PEM) control unit. From investigations of the light emission spectra of the magnetron discharge the intensive tungsten line at 401 nm was selected as most suitable for the process control. Both for W and WC targets the deposition rates as well as the metal contents in the films were determined as a function of the PEM intensity. The PEM intensity (ad justed to 100% for "clean" targets, decreasing monotonously with increasing acetylene flow) was proved to be a suitable parameter to approach reproducible deposition processes. Furthermore the experimental data allow to estimate the contributions of sputtering and plasma polymerization to the Me-C:H growth. The prepared coatings were characterized by X-ray diffraction as well as by hardness measurements and tribological tests.