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Postprocessing of nm-period multilayer structure

Nachbehandlung von nm-Multischichtstrukturen

Karthe, W. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Nanofabrication technologies and device integration
Bellingham/Wash.: SPIE, 1994 (Europto series)
ISBN: 0-8194-1517-0
pp.24-34 - Abb.,Lit.,Tab.
Conference on Nanofabrication Technologies and Device Integration <1994, Lindau>
International Symposium on Integrated Optics <1994, Lindau>
Conference Paper
Fraunhofer IWS ()
nanostructure; Nanostrukturen; Ni/C-multilayer; Ni/C-Multischicht; scanning tip microscopy; STM

We study effects of macro- and micro-postprocessing of multilayered synthetic Ni/C film structures. The structures have nm-period one-dimensional modulation of concentration of the major components. Initially low surface and interface roughness of such structures makes them advantageous for application as a new type of substrates n nanofabrication technologies and for information storage with nm-resolution. Metastability of microstructure and high residual stresses favour the use of the structures themselves as a media for fine-scale processing.