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Plasma source for ion and electron beam lithography
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1998
Journal Article
Titel
Plasma source for ion and electron beam lithography
Author(s)
Lee, Y.
Leung, K.N.
Fallmann, W.
Torkler, M.
Bruenger, W.H.
Zeitschrift
Journal of vacuum science and technology B. Microelectronics and nanometer structures
DOI
10.1116/1.590460
Language
English
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Fraunhofer-Institut für Siliziumtechnologie ISIT