English
Deutsch
Log In
Log in with Fraunhofer Smartcard
Password Login
Research Outputs
Fundings & Projects
Researchers
Institutes
Statistics
Fraunhofer-Gesellschaft
Home
Fraunhofer-Gesellschaft
Artikel
Plasma source for ion and electron beam lithography
Details
Full
Export
Statistics
Options
Show all metadata (technical view)
1998
Journal Article
Title
Plasma source for ion and electron beam lithography
Author(s)
Lee, Y.
Leung, K.N.
Fallmann, W.
Torkler, M.
Bruenger, W.H.
Journal
Journal of vacuum science and technology B. Microelectronics and nanometer structures
DOI
10.1116/1.590460
Language
English
Fraunhofer-Institut für Siliziumtechnologie ISIT
