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The plasma focus as soft x-ray source for microscopy and lithography.

Der Plasmafokus als weiche Röntgenquelle für Mikroskopie und Lithographie
: Richter, F.; Eberle, J.; Holz, R.; Neff, W.; Lebert, R.

Benattar, R. ; European Federation for Applied Optics -Europtica-; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.; European Physical Society -EPS-, Geneva:
X-ray instrumentation in medicine and biology, plasma physics, astrophysics, and synchrotron radiation : Conference Paris 25 - 28 April 1989
Bellingham, Wash.: SPIE, 1989 (Proceedings of SPIE 1140)
ISBN: 0-8194-0176-5
Society of Photo-Optical Instrumentation Engineers <1989, Paris>
Conference Paper
Fraunhofer ILT ()
charakteristisch; Lithographie; lithography; microscopy; Mikroskopie; nitrogen; plasma focus; Plasmafokus; radiation processes; Röntgenquelle; spectral characteristics; spektral; Strahlungsprozeß; Wasserfenster; water window; x-ray source

Plasmafocus devices producing small volume of plasma with electron density n sub e about 10 high 20 cm high -3 and mean particle energy of about 1 keV seem to meet the requirements for compact X-ray sources for industrial use. Their emission properties can be taylored for X-ray microscopy where narrowband emission with high spectral brilliance in the water window (2.4 nm to 4.3 nm) is required, as well as for X-ray lithography demanding for high mean power in the wavelength region from 0.7 nm to 1.0 nm. For X-ray microscopy the emission of Lyman-Alpha lines is of advantage whereas for X-ray lithography the broadband continuum and line radiation can be used. For X-ray microscopy a single pulse source using the 1s - 2p line of nitrogen VII at 2.48 nm and for X-ray lithography a source running with several Hz repetition rate using the emission of hydrogen- and heliumlike neon ions around 1 nm are being developed.