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Plasma deposition, properties and structure of amorphous hydrogenated carbon films.

Plasmaabscheidung, Eigenschaften und Struktur amorpher, wasserstoffhaltiger Kohlenstoffschichten
 

Applied optics 52/53 (1989), pp.41-70 : Abb.,Tab.,Lit.
ISSN: 0003-6935
ISSN: 1539-4522
ISSN: 1559-128X
English
Journal Article
Fraunhofer IAF ()
amorpher Kohlenstoff; amorphous carbon; diamantartiger Kohlenstoff; diamondlike carbon; plasma deposition; Plasmaabscheidung

Abstract
Plasma deposition and properties of a-C:H are reviewed. The role of process gas, plasma chemistry and plasma surface interaction is discussed. It is shown that the deposition energy of the hydrocarbons is the most critical deposition parameter in determining the film properties. Hard a-C:H films with precursor-independent properties are obtained if the deposition energy is large enough to allow efficient fragmentation of the energetic hydrocarbons at the film surface. Otherwise, soft polymerlike films are obtained at low deposition energies. As a key for the understanding of the a-C:H properties, hydrogen incorporation, carbon bonding and network structure - as studied by IR and Raman spectroscopy - are discussed.

: http://publica.fraunhofer.de/documents/PX-28758.html