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Plasma-activated high-rate evaporation using a spotless cathodic arc
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1994
Conference Paper
Titel
Plasma-activated high-rate evaporation using a spotless cathodic arc
Author(s)
Goedicke, K.
Scheffel, B.
Schiller, S.
Hauptwerk
ICMCTF '94. International Conference on Metallurgical Coatings and Thin Films. Proceedings. Vol.1
Konferenz
International Conference on Metallurgical Coatings and Thin Films 1994
Language
English
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Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP