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Plasma-activated high-rate evaporation using a spotless cathodic arc

 
: Goedicke, K.; Scheffel, B.; Schiller, S.

Jehn, H.A.; McGuire, G.E.; Sartwell, B.D.:
ICMCTF '94. International Conference on Metallurgical Coatings and Thin Films. Proceedings. Vol.1
Amsterdam u.a.: Elsevier, 1994
pp.799-803
International Conference on Metallurgical Coatings and Thin Films <21, 1994, San Diego>
English
Conference Paper
Fraunhofer FEP ()

: http://publica.fraunhofer.de/documents/PX-28746.html