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Plasma-activated high-rate evaporation using a low-voltage EB system
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1994
Conference Paper
Title
Plasma-activated high-rate evaporation using a low-voltage EB system
Author(s)
Schiller, S.
Hötzsch, G.
Neumann, M.
Morgner, H.
Zywitzki, O.
Mainwork
ICMCTF '94. International Conference on Metallurgical Coatings and Thin Films. Proceedings. Vol.1
Conference
International Conference on Metallurgical Coatings and Thin Films 1994
Language
English
Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP
