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  4. Picosecond photodetectors fabricated on low temperature GaAs
 
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1992
Conference Paper
Title

Picosecond photodetectors fabricated on low temperature GaAs

Other Title
Pikosekunden Photodetektoren hergestellt auf GaAs, gewachsen bei tiefen Temperaturen
Abstract
GaAs metal-semiconductor-metal photodiodes fabricated on GaAs grown at low substrate temperatures (200 degree C) have been investigated in the time domain by electro-optic sampling. It could be shown, that these diodes have a faster response and a considerably reduced long time tail. They can be used at larger bias than comparable diodes produced on GaAs grown at 700 degree C. Temperature dependent measurements show, that the tail can be described by hopping conductivity and disappears below 50 K.
Author(s)
Klingenstein, M.
Kuhl, J.
Nötzel, R.
Ploog, K.
Rosenzweig, Josef  
Moglestue, C.
Schneider, J.
Hülsmann, A.
Köhler, Klaus  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Mainwork
Ultrafast processes in spectroscopy 1991. Proceedings  
Conference
International Symposium on Ultrafast Processes in Spectroscopy 1991  
Language
English
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Keyword(s)
  • GaAs

  • III-V Halbleiter

  • III-V semiconductors

  • low temperature

  • photodiode

  • tiefe Temperatur

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