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Phosphorus pentaflouride and sulfurylfluoride applied to etch SiO2 in search for higher selectivities
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1982
Journal Article
Titel
Phosphorus pentaflouride and sulfurylfluoride applied to etch SiO2 in search for higher selectivities
Author(s)
Eisele, K.M.
Zeitschrift
Journal of the Electrochemical Society
Language
English
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Fraunhofer-Institut für Angewandte Festkörperphysik IAF
Tags
Plasmaaetzverfahren
Silizium
Siliziumdioxid