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Perpendicular-incidence photometric ellipsometry of biaxial anisotropic thin films

	Applied optics 35 (1996), No.28, pp.5553-5556 ISSN: 0003-6935 ISSN: 1539-4522 ISSN: 1559-128X

	English
	Journal Article
	Fraunhofer IOF ()
	Dünne optische Schicht; excimer laser optics; fluoride thin films; Fluoridschicht; laser induced damage threshold; Laserzerstörschwelle; optical coating; optical thin films; oxide thin films; Oxidschicht; ultraviolet spectral region; ultravioletter Spektralbereich; UV

Abstract
A new measurement technique for the characterization of uniaxial as well as biaxial anisotropic surfaces and thin films is introduced. This technique is based on perpendicular-incidence photometric ellipsometry, in which a spectral-photometric dynamic ellipsometer with a rotating polarizer is used. This method is sensitive, contactless, nondestuctive, and efficient for the estimation of anisotropic behavior. Furthermore, the spectroscopic measurement directly provides the anisotropy dispersion down to the UV wavelength range. Results on structurally anisotropic HfO2, coatings are presented.

: http://publica.fraunhofer.de/documents/PX-28210.html