Perpendicular-incidence photometric ellipsometry of biaxial anisotropic thin films

A new measurement technique for the characterization of uniaxial as well as biaxial anisotropic surfaces and thin films is introduced. This technique is based on perpendicular-incidence photometric ellipsometry, in which a spectral-photometric dynamic ellipsometer with a rotating polarizer is used. This method is sensitive, contactless, nondestuctive, and efficient for the estimation of anisotropic behavior. Furthermore, the spectroscopic measurement directly provides the anisotropy dispersion down to the UV wavelength range. Results on structurally anisotropic HfO2, coatings are presented.