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Perpendicular-incidence photometric ellipsometry of biaxial anisotropic thin films

: Kaiser, N.; Zuber, A.; Jänchen, H.

Applied optics 35 (1996), No.28, pp.5553-5556
ISSN: 0003-6935
ISSN: 1539-4522
ISSN: 1559-128X
Journal Article
Fraunhofer IOF ()
Dünne optische Schicht; excimer laser optics; fluoride thin films; Fluoridschicht; laser induced damage threshold; Laserzerstörschwelle; optical coating; optical thin films; oxide thin films; Oxidschicht; ultraviolet spectral region; ultravioletter Spektralbereich; UV

A new measurement technique for the characterization of uniaxial as well as biaxial anisotropic surfaces and thin films is introduced. This technique is based on perpendicular-incidence photometric ellipsometry, in which a spectral-photometric dynamic ellipsometer with a rotating polarizer is used. This method is sensitive, contactless, nondestuctive, and efficient for the estimation of anisotropic behavior. Furthermore, the spectroscopic measurement directly provides the anisotropy dispersion down to the UV wavelength range. Results on structurally anisotropic HfO2, coatings are presented.