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3D structures using gray tone lithography
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1997
Conference Paper
Title
3D structures using gray tone lithography
Author(s)
Reimer, K.
Wagner, B.
Kalus, M.
Frey, M.
Buchmann, L.
Mainwork
Mask technology for integrated circuits and micro-components. Lectures held at the GMM-conference
Conference
VDE/VDI-Gesellschaft Mikroelektronik, Mikro- und Feinwerktechnik (Fachtagung) 1997
Language
English
IFT
Fraunhofer-Institut für Siliziumtechnologie ISIT
