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One- and two-dimensional process simulation with ICECREM and COMPLAN.

Ein- und zweidimensionale Prozeßsimulation mit ICECREM und COMPLAN
: Pichler, P.; Dürr, R.; Holzer, N.; Schott, K.; Barthel, A.; Lorenz, J.; Ryssel, H.

NASECODE VI. Software Forum Digest
ISBN: 0-906783-90-9
NASECODE <6, 1989, Dublin>
Conference Paper
Fraunhofer IIS B ( IISB) ()
process simulation; program

Numerical simulation of processes has shown to be an important tool for development in the fields of VLSI and power devices. To satisfy the particular needs, ICECREM has been developed as one-dimensional process simulator during a period of nearly one decade, and COMPLAN has been designed to enable two-dimensional simulation of ion-implantation on a personal computer. A general overview of the program structures and the implemented models will be given and applications will be shown.