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Numerical simulations of microwave plasma reactors for diamond CVD

Numerische Simulationen von Mikrowellen-Plasmareaktoren für die Diamant-CVD
: Füner, M.; Wild, C.; Koidl, P.


Surface and coatings technology 74/75 (1995), pp.221-226 : Abb.,Lit.
ISSN: 0257-8972
Journal Article
Fraunhofer IAF ()
microwave; Mikrowelle; numerical; numerisch; plasma; simulation

A model has been developed simulating electromagnetic fields and plasma densities of reactors for microwave plasma assisted chemical vapour deposition. Computer programs calculate alternately the electric field for a given spatial distribution of the plasma and the plasma for a given distribution of the electric field. This procedure converges towards a self-consistent solution of the microwave field-plasma system described by parameters such as collision frequency, electric breakdown and maintenance field strength and an adjustable parameter Gamma relating electric field strength and plasma density. One key feature of the simulation is the straightforward possibility to model reactors with spatially varying dielectric properties. The calculations are successfully applied to simulate (i) a linear plasma system, where the plasma coaxially surrounds a quartz tube, and (ii) the TM01 mode reactor widely used in diamond CVD.