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Novel approach to simulation of the silylation bake in the DESIRE process
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1996
Journal Article
Titel
Novel approach to simulation of the silylation bake in the DESIRE process
Author(s)
Weiß, M.
Goethals, M.
Zeitschrift
Microelectronic engineering
DOI
10.1016/0167-9317(95)00253-7
Language
English
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Fraunhofer-Institut für Siliziumtechnologie ISIT