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Novel approach to defect etching in thin film SOI. Part 1
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1992
Conference Paper
Titel
Novel approach to defect etching in thin film SOI. Part 1
Author(s)
Gassel, H.
Peter-Weidemann, J.
Vogt, H.
Hauptwerk
Electrochemical Society Meeting '92. Extended Abstracts
Konferenz
Electrochemical Society (Meeting) 1992
Language
English
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Fraunhofer-Institut für Mikroelektronische Schaltungen und Systeme IMS
Tags
defect etching
Ionenimplantation
silicon-on-insulator
SIMOX
SOI