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NH4OH-based etchants for silicon micromachining

 
: Schnakenberg, U.; Löchel, B.; Benecke, W.

:

Sensors and Actuators. A 21 (1990), pp.1031-1035
ISSN: 0924-4247
English
Journal Article
Fraunhofer ISIT ()

Abstract
Wet chemical etchants based on ammonium hydroxide-water (AHW) solutions for micromachining monocrystalline silicon are described. The etchants can be applied under clean-room conditions within standard IC fabrication lines. The nature of AHW solutions is discussed with respect to anisotropy and selectivity. At 75 degrees C and 9 wt. per cent AHW, a maximum etch rate for (100) silicon of approximately 30 mym/h has been determined. (111):(100) etch rate ratios show values around 4 per cent. AHW etchants exibit an excellent selectivity to SiO sub 2, Si sub 3 N sub 4 and highly boron-doped silicon. Aluminium will not be attacked by silicon-doped AHW etchants. Therefore, standard IC metallization techniques can be used for device fabrication. The application of AHW solutions to the fabrication of basic micromechanical structures is demonstrated.

: http://publica.fraunhofer.de/documents/PX-26295.html