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New developments in pulsed magnetron sputter technology for glass coater

 
: Schiller, S.; Goedicke, K.; Kirchhoff, V.; Kopte, T.

Third International Symposium on Sputtering and Plasma Processes. ISSP '95. Proceedings
1995
pp.71-78
International Symposium on Sputtering and Plasma Processes <3, 1995, Tokyo>
English
Conference Paper
Fraunhofer FEP ()

: http://publica.fraunhofer.de/documents/PX-26128.html