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  4. Nd-YAG laser annealing of arsenic-implanted silicon - Relaxation of metastable concentration by means of CO2-laser irradiation.
 
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1981
Journal Article
Title

Nd-YAG laser annealing of arsenic-implanted silicon - Relaxation of metastable concentration by means of CO2-laser irradiation.

Other Title
Nd-YAG Laserausheilung von Arsen implantiertem Silizium - Relaxation der metastabilen Konzentration mit Hilfe von CO2- Laserbestrahlung
Author(s)
Tsien, P.H.
Ryssel, H.
Roeschenthaler, D.
Ruge, I.
Journal
Journal of applied physics  
Language
English
IFT  
Keyword(s)
  • Arsen

  • implantation

  • Laserannealing

  • Silizium

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