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Multi electron beam lithography - fabrication of a control unit

: Schnakenberg, U.; Wallendszus, V.; Heuberger, A.; Lischke, B.; Benecke, W.; Müller, K.P.

Microelectronic engineering 9 (1989), pp.205-208 : Abb.
ISSN: 0167-9317
Journal Article
Fraunhofer ISIT ()

Electron beam lithography is limited by the extremely low throughput of currently working machines. This paper describes a multiple beam forming unit for a new line printer type lithography system called High Speed, High Resolution Electron Lithography System (HISEL). The simultaneous use of a multiple number of individually controllable electron beams allows an essential reduction of the pattern transfer time. In a first version, a total number of 1024 electron beams is used. The control unit consists of two independent elements: the aperture plate (illuminated by an electron line type source) which forms a line of 1024 square -shaped (10x10)mym high 2 electron beams and the deflection plate with a corresponding set of 1024 microcapacitors. The capacitors allow an individual beam deflection, e.g. on-off switching of the beams. The fabrication is based on silicon micromechanics and X-ray lithography.