• English
  • Deutsch
  • Log In
    Password Login
    Research Outputs
    Fundings & Projects
    Researchers
    Institutes
    Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Artikel
  4. Multi-beam concepts for nanometer devices
 
  • Details
  • Full
Options
1989
Journal Article
Title

Multi-beam concepts for nanometer devices

Abstract
To overcome the throughput limitations in electron beam nanolithography, a multi beam system is proposed. Theoretical considerations show that this e-beam comb-probe printer with 1024 probes will be capable of combining 25 nm resolution with a maximum beam current of 5 MyA. This allows an exposure speed of 0.1 square centimeter/s, which is orders of magnitude superior to today's most advanced equipment. In addition, the multi beam principle is considered for nanometer pattern inspection and for ion-beam techniques. The basic concepts for these applications are presented. Practical feasibility investigations are the subject of current research.
Author(s)
Lischke, B.
Brunner, M.
Herrmann, K.H.
Heuberger, A.
Knapek, E.
Schnakenberg, U.
Bennecke, W.
Schäfer, P.
Journal
Japanese Journal of applied physics. Part 2, Letters  
Language
English
Fraunhofer-Institut für Siliziumtechnologie ISIT  
Keyword(s)
  • comb probe printer

  • electron beam lithography

  • multi beam concept

  • multi beam inspection

  • multi beam technique

  • nanometer pattern

  • wafer exposure

  • X-ray lithography

  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Contact
© 2024