Publica
Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten. Multi-beam concepts for nanometer devices
| Japanese Journal of applied physics. Part 2, Letters 28 (1989), No.10, pp.2058-2064
ISSN: 0021-4922 |
|
| English |
| Journal Article |
| Fraunhofer ISIT () |
| comb probe printer; electron beam lithography; multi beam concept; multi beam inspection; multi beam technique; nanometer pattern; wafer exposure; X-ray lithography |
Abstract
To overcome the throughput limitations in electron beam nanolithography, a multi beam system is proposed. Theoretical considerations show that this e-beam comb-probe printer with 1024 probes will be capable of combining 25 nm resolution with a maximum beam current of 5 MyA. This allows an exposure speed of 0.1 square centimeter/s, which is orders of magnitude superior to today's most advanced equipment. In addition, the multi beam principle is considered for nanometer pattern inspection and for ion-beam techniques. The basic concepts for these applications are presented. Practical feasibility investigations are the subject of current research.