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Monte-Carlo simulation of silicon amorphization during ion implantation

 

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IEEE transactions on computer-aided design of integrated circuits and systems 17 (1998), pp.1236
ISSN: 0278-0070
English
Journal Article
Fraunhofer IIS B ( IISB) ()
Amorphisierung; amorphization; Halbleitertechnologie; ion implantation; Ionenimplantation; Monte-Carlo simulation; process simulation; Prozeßsimulation; semiconductor technology

: http://publica.fraunhofer.de/documents/PX-25117.html