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Modern CMOS technology

 
: Zimmer, G.

6th International School on Physical Problems in Microelectronics '89. Proceedings
1989
pp.79-83
International School on Physical Problems in Microelectronics <6, 1989, Varna>
English
Conference Paper
Fraunhofer IMS ()

Abstract
Silicon based very large scale integration (VLSI) technology has become the driving force of the electronics industry. One chip microcomputers, signal processors or multi megabit random access memories are products now evailable. This tals will show why CMOS emerged as the main VLSI technology. The basic CMOS processing scheme, scaling and options to improve. The basic CMOS processing scheme, scaling and options to improve its performance will be discussed. A new technology concept uses dielectrically insulated transistors for increasing packing density, reduction of radiation effects and elimination of latch up. The most promising approach, SIMOX (Separation by implanted oxygen) will be presented.

: http://publica.fraunhofer.de/documents/PX-24691.html