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  4. Micropatterned multilayer dielectric filters with two spectral characteristics
 
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1997
Journal Article
Title

Micropatterned multilayer dielectric filters with two spectral characteristics

Abstract
Micropatterned interference filters are developed by dry etching of dielectric multilayer stacks. The application of reactive-ion etching (RIE) techniques combined with the use of an etchstop layer are shown to be quite effective in producing two-stage micropatterns with defined spectral properties. By using a MgF2 underlayer the etching of TiO2 and Si02 layers is stopped exactly. Which provides the possibility to develop large area patterns (>lxl cm2) with feature sizes as small as 10 mu m. The distortion of edge features is shown to be better than 1 mu m. A filter array was developed providing high-reflection and antireflection coatings within a period of 20 mu m.
Author(s)
Frank, M.
Schallenberg, U.B.
Kaiser, N.
Journal
Optical engineering  
DOI
10.1117/1.601241
Language
English
Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF  
Keyword(s)
  • Ätzstop

  • dielectric filter

  • dielektrischer Filter

  • dry etching

  • micropattern

  • Mikropattern

  • spectral characteristics

  • Spektralcharakterisierung

  • Trockenätzen

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