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LPVD - fundamentals of material removal and transfer

 
: Alunovic, M.; Funken, J.; Kreutz, E.W.; Sung, H.; Voss, A.

Matsunawa, A.; Katayama, S.:
LAMP '92. Proceedings of International Conference on Laser Advanced Materials Processing. Science and Applications. Vol.1
1992 (Laser Advanced Materials Processing)
ISSN: 0918-2993
pp.353-359 : Abb.,Lit.
International Conference on Laser Advanced Materials Processing <2, 1992, Nagaoka>
English
Conference Paper
Fraunhofer ILT ()
deposition technique; emission spectra; laser parameter; physical vapour; transmitting window; vacuum chamber

Abstract
The removal and the transfer of target materials, as the most important, physical processes in LPVD highly dominating the thin film formation on substrates, are investigated as a function of laser parameters and processing variables. The removal of the target material was measured by a microbalance, the transfer by emission vapour/plasma states are observed which are used in combination with the geometrical arrangement of target and substrate to generate various film structures in view of applications.

: http://publica.fraunhofer.de/documents/PX-22512.html