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  4. LPVD - fundamentals of material removal and transfer
 
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1992
Conference Paper
Title

LPVD - fundamentals of material removal and transfer

Abstract
The removal and the transfer of target materials, as the most important, physical processes in LPVD highly dominating the thin film formation on substrates, are investigated as a function of laser parameters and processing variables. The removal of the target material was measured by a microbalance, the transfer by emission vapour/plasma states are observed which are used in combination with the geometrical arrangement of target and substrate to generate various film structures in view of applications.
Author(s)
Alunovic, M.
Funken, J.
Kreutz, E.W.
Sung, H.
Voss, A.
Mainwork
LAMP '92. Proceedings of International Conference on Laser Advanced Materials Processing. Science and Applications. Vol.1  
Conference
International Conference on Laser Advanced Materials Processing 1992  
Language
English
Fraunhofer-Institut für Lasertechnik ILT  
Keyword(s)
  • deposition technique

  • emission spectra

  • laser parameter

  • physical vapour

  • transmitting window

  • vacuum chamber

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