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LPVD - fundamentals of material removal and transfer
|Matsunawa, A.; Katayama, S.:|
LAMP '92. Proceedings of International Conference on Laser Advanced Materials Processing. Science and Applications. Vol.1
1992 (Laser Advanced Materials Processing)
pp.353-359 : Abb.,Lit.
|International Conference on Laser Advanced Materials Processing <2, 1992, Nagaoka>|
| Conference Paper|
|Fraunhofer ILT ()|
| deposition technique; emission spectra; laser parameter; physical vapour; transmitting window; vacuum chamber|
The removal and the transfer of target materials, as the most important, physical processes in LPVD highly dominating the thin film formation on substrates, are investigated as a function of laser parameters and processing variables. The removal of the target material was measured by a microbalance, the transfer by emission vapour/plasma states are observed which are used in combination with the geometrical arrangement of target and substrate to generate various film structures in view of applications.