Linewidth metrology for X-rax masks with subhalfmicron feature size

A linewidtdh metrology based on electron optical methods has been developed and applicated to X-ray masks with subhalf-micron feature size. The sensitivity of the measurement technique to process variations has been investigated. Linewidth down to 0.2 mym on X-ray masks are measured automatically with high precision (24 nm at 3 sigma) and high throughput feasibility. (IMT)