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Linewidth metrology for X-rax masks with subhalfmicron feature size

: Huber, H.-L.; Mescheder, U.; Mund, F.

Microelectronic engineering 6 (1987), No.1-4, pp.653-659
ISSN: 0167-9317
Journal Article
Fraunhofer ISIT ()
Metrologie; metrology; Röntgenmaskentechnologie; X-ray lithography

A linewidtdh metrology based on electron optical methods has been developed and applicated to X-ray masks with subhalf-micron feature size. The sensitivity of the measurement technique to process variations has been investigated. Linewidth down to 0.2 mym on X-ray masks are measured automatically with high precision (24 nm at 3 sigma) and high throughput feasibility. (IMT)