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  4. Laser induced plasma - a source of control of the properties of thin films
 
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1993
Journal Article
Title

Laser induced plasma - a source of control of the properties of thin films

Abstract
The temporal and spatial properties of laser-induced vapour and/or plasma involved in thin film deposition were investigated as a function of laser parameters (wavelength, power density distribution) and processing variables (target-substrate arrangement, superposed r.f. fields). The composition and ionization state of the vapour and plasma were measured by emission spectroscopy, and the geometry and dynamics of the vapour-plasma plume were measured by high-speed photography. The number and type of ionized species impinging on the growing films were varied in combination with the target-substrate arrangement to generate various film structures which are discussed with respect to applications.
Author(s)
Kreutz, E.W.
Voss, A.
Alunovic, M.
Funken, J.
Sung, H.
Journal
Surface and coatings technology  
DOI
10.1016/0257-8972(93)90050-X
Language
English
Fraunhofer-Institut für Lasertechnik ILT  
Keyword(s)
  • emission spectroscopy

  • experimental apparatus

  • fibre technique

  • film technology

  • vapour-plasma plume

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