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Laser damage of optical coatings from UV to deep UV at 193 nm

 
: Dijon, J.; Quesnel, E.; Pelle, C.; Thielsch, R.

Exarhos, G.J. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Laser-Induced Damage in Optical Materials 1998
Bellingham, Wash.: SPIE, 1999 (SPIE Proceedings Series 3578)
ISBN: 0-8194-3045-5
pp.54-63
Annual Boulder Damage Symposium <30, 1998, Boulder/Colo.>
English
Conference Paper
Fraunhofer IOF ()
coating; deep UV; laser damage; thin films; ultra violet

Abstract
Scanning electron microscope observations off damaged coatings from 355nm to 193nm are reported. From these results it appears that oxide based coating are strongly limited at 193nm while they performed very well at the other wavelength. Damages occurs at the coating surface for oxides while they concern both surface and substrate interfaces with fluoride base coatings. While fluorides have a better threshold than oxide at 193nm they are limited by localized defects. The ability to overcome this limitation with ion beam sputtering fluoride material at 193nm starting from results at 355nm.

: http://publica.fraunhofer.de/documents/PX-21523.html