• English
  • Deutsch
  • Log In
    Password Login
    Research Outputs
    Fundings & Projects
    Researchers
    Institutes
    Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Konferenzschrift
  4. Laser conditioning of LaF3/MgF2 dielectric coatings for excimer lasers
 
  • Details
  • Full
Options
1995
Conference Paper
Title

Laser conditioning of LaF3/MgF2 dielectric coatings for excimer lasers

Abstract
LaF3/MgF2 -dielectric thin film combinations can be applied in optics for wavelengths down to 150 nm. Several such HR systems for a wavelength of 248 nm were investigated. In these coatings, the influence of laser conditioning on damage threshold and absorptivity was found to be remarkable. XPS- and TEM-investigations showed that the conditioning effect is related to structural and stoichiometric changes in the multilayers, especially in the near-surface-sublayers.
Author(s)
Kaiser, N.
Anton, B.
Jänchen, H.
Mann, K.
Eva, E.
Fischer, C.
Henking, R.
Ristau, D.
Weißbrodt, P.
Mademann, D.
Raupach, L.
Hacker, E.
Mainwork
Laser-Induced Damage in Optical Materials 1994. Proceedings  
Conference
Annual Boulder Damage Symposium 1994  
Annual Symposium on Optical Materials for High-Power Lasers 1994  
Language
English
Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF  
Keyword(s)
  • Dünne optische Schicht

  • excimer laser optics

  • Excimer-Laser-Optik

  • fluoride thin films

  • Fluoridschicht

  • laser induced damage threshold

  • Laserzerstörschwelle

  • optical coating

  • optical thin films

  • oxide thin films

  • Oxidschicht

  • ultraviolet spectral region

  • ultravioletter Spektralbereich

  • UV

  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Contact
© 2024