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Laser-assisted physical vapour deposition of ceramics



Surface and coatings technology (1992), No.52, pp.221-227 : Abb.,Lit.
ISSN: 0257-8972
International Conference on Metallurgical Coatings and Thin Films <18, 1991, San Diego/Calif.>
Conference Paper
Fraunhofer ILT ()
ceramic; laser parameter; metal; microscopy; technique; vaporisation

The laser-assisted physical vapour deposition of ceramics by photoninduced removal or vapourization of ceramic targets with subsequent deposition on stainless stell or hard metals. Different modes of laser operation and variation in laser power, beam geometry, beam diameter and traverse speed result in different power densities, interaction times and heating times in order to achieve different conditions of vapourization and plasma formation, which are investigated by mass loss measurements, optical microscopy and scanning electron microscopy of the ceramic targets. Different depostion conditions are achieved by variation in laser radiation parameters and processing variables, especially variation in the flow characteristics and the composition of the processing gas, to relate processing conditions to film dimensions as well as to ists resultant structural and mechanical properties. The structural properties of the deposited films are investigated by scanning electron microscopy. X-ray diffraction and X-ray microprobe, the chemical properties by energy-dispersive X-ray spectroscopy, and the mechanical properties by the ball grinding method and hardness measurements. The films, which are highly compact without pores, are deduced to be amporphous and nearly stoichiometric with high adhesion strength and surface hardness.