• English
  • Deutsch
  • Log In
    Password Login
    Research Outputs
    Fundings & Projects
    Researchers
    Institutes
    Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Artikel
  4. Ion beam processing of SiC for optical application
 
  • Details
  • Full
Options
1999
Journal Article
Title

Ion beam processing of SiC for optical application

Abstract
By means of McV oxygen ion implantation at elevated temperatures into 6H-SiC and subsequent thermal annealing buried SiC-SiO, layers with refractive indices reduced towards the value of SiO2 were formed. These layers act as optical barriers for the overlying weakly damaged SiC layers which, according to m-line spectroscopy measurements, show multimode waveguiding at the wavelength 633 nm. Focused Ga ion beams were used for maskless patterning of SiC either by amorphization followed by wet chemical etching or by physical sputtering. A combination of large area oxygen ion implantation with focused ion beam patterning offers a promising way to produce strip waveguides in SiC.
Author(s)
Wesch, W.
Heft, A.
Menzel, R.
Bachmann, T.
Peiter, G.
Hobert, H.
Höche, T.
Dannberg, P.
Bräuer, A.
Journal
Nuclear instruments and methods in physics research, Section B. Beam interactions with materials and atoms  
DOI
10.1016/S0168-583X(98)00826-X
Language
English
Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF  
Keyword(s)
  • ion implantation

  • optical properties

  • SiC

  • Wave guides

  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Contact
© 2024