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Ion-assisted deposition of oxide materials at room temperature by use of different ion sources



Applied optics 38 (1999), No.16, pp.3610-3613
ISSN: 0003-6935
ISSN: 1539-4522
ISSN: 1559-128X
Journal Article
Fraunhofer IOF ()
e-beam deposition; ion-assisted deposition; light scattering; optical coatings; roughness; thin films

Thin films of SiO2, Ti02, Ta205, ZrO, and the mixed oxide H4 (Merek) have been deposited onto nonheated glass substrates by electron-beam evaporation in commercial coating plants. All depositions have been carried out with ion assistance provided by three different ion or plasma sources (end-hall, plasma, and cold-cathode sources). The optical film properties such as index of refraction, extinction coefficient. light scattering, and absorption have been examined by spectrophotometry, laser calorimetry, and total integrated light-scatter measurements. Surface morphology has been investigated by atomic force microscopy studies. Furthermore, films have undergone sand erosion tests for the determination of relative wear resistance. The film properties are compared for the three different ion sources.