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Ion assisted deposition of optical coatings on cold substrates. A comparison of processes using different ion sources

 
: Schallenberg, U.; Laux, D.; Duparre, A.; Kaiser, N.; Kennedy, V.M.; Ristau, D.

Optical Society of America -OSA-, Washington/D.C.:
OSA Conference on Optical Interference Coatings 1998
Washington, DC: OSA, 1998 (OSA Technical digest series 1998,9)
ISBN: 1-55752-521-8
pp.5-7
Conference on Optical Interference Coatings <1998, Tucson/Ariz.>
English
Conference Paper
Fraunhofer IOF ()
ion assisted deposition; low temperature deposition; optical constants; scattering; thin fluoride film; thin oxide film

Abstract
Concerning optical and structural properties, for different oxide and fluoride materials IAD-coating processes based on different ion sources (end-hall-, cold-cathode- and advanced plasma source) were compared.

: http://publica.fraunhofer.de/documents/PX-20046.html