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  4. Ion assisted deposition of optical coatings on cold substrates. A comparison of processes using different ion sources
 
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1998
Conference Paper
Title

Ion assisted deposition of optical coatings on cold substrates. A comparison of processes using different ion sources

Abstract
Concerning optical and structural properties, for different oxide and fluoride materials IAD-coating processes based on different ion sources (end-hall-, cold-cathode- and advanced plasma source) were compared.
Author(s)
Schallenberg, U.
Laux, D.
Duparre, A.
Kaiser, N.
Kennedy, V.M.
Ristau, D.
Mainwork
OSA Conference on Optical Interference Coatings 1998  
Conference
Conference on Optical Interference Coatings 1998  
Language
English
Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF  
Keyword(s)
  • ion assisted deposition

  • low temperature deposition

  • optical constants

  • scattering

  • thin fluoride film

  • thin oxide film

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