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Investigation of the thermal stability of NI/C multilayers by X-ray methods

Untersuchungen der Temperaturstabilität von Ni/C-Multischichten durch Röntgenmethoden
 

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Fresenius Journal of Analytical Chemistry 353 (1995), pp.246-250
ISSN: 0937-0633
Arbeitstagung Angewandte Oberflächenanalytik (AOFA) <8, 1994, Kaiserslautern>
English
Conference Paper
Fraunhofer IWS ()
dünne Schicht; laser ablation; Ni/C-multilayer; Ni/C-Multischicht; Röntgendiffraktometrie; Röntgenreflektometrie; Röntgenspiegel; thermal stability; thermische Stabilität; thin films; x-ray diffractometry; X-ray mirror; X-ray reflectometry

Abstract
Microstructural properties of Ni/C multilayers prepared by PLD (pulsed laser deposition) have been investigated after heat treatment in vacuum at temperatures in the range of 50 degree C to 500 degree C. X-ray-diffractometry, X-ray-reflectometry, fluorescence EXAFS (extended X-ray absorption fine structure) and HREM (high resolution transmission electron microscopy) have been applied to characterize samples in the initial state and after annealing. The multilayer reflectivity remained unchanged or increased at temperatures below 400 degree C due to sharpening of the interface caused by the formation of a nickel and nickel carbide. The reflectivity decreased at temperatures above 400 degree C because of the fragmentation of the nickel layers. It can be shown, that both chemical and mechanical driving forces are responsible for the observed modifications of the initial specimen state.

: http://publica.fraunhofer.de/documents/PX-19972.html