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  4. Interaction of UV-laser-radiation with dielectric thin films
 
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1996
Journal Article
Title

Interaction of UV-laser-radiation with dielectric thin films

Abstract
The interaction of UV laser radiation with optical coatings is shown to be properly investigated by a pulsed two probe-beam photothermal technique. UV laser damage resistivity studies on LaF3/MgF2, Al2O3/SiO2, HfO2/SiO2 multilayer stacks have been performed at lambda = 248 nm, tau = 20 ns. Investigating these by changing the number of (HL) pairs and the substrate material, optical and thermal coating properties were shown to be responsible for UV single-shot laser damage. Similarly, the damage threshold of selected samples is to be influenced by the deposition technique. The influence of the bandgap energy of typical UV thin-film oxide materials on the damage has been investigated. Furthermore, multishot damage measurements on LaF3/MgF2, high-reflecting multilayer coatings reveal the accumulation of laser energy in the predamage range.
Author(s)
Kaiser, N.
Welsch, E.
Ettrich, K.
Blaschke, H.
Schäfer, D.
Thomsen-Schmidt, P.
Journal
Experimental technique of physics  
Language
English
Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF  
Keyword(s)
  • Dünne optische Schicht

  • excimer laser optics

  • fluoride thin films

  • Fluoridschicht

  • laser induced damage threshold

  • Laserzerstörschwelle

  • optical coating

  • optical thin films

  • oxide thin films

  • Oxidschicht

  • ultraviolet spectral region

  • ultravioletter Spektralbereich

  • UV

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