Infrared micromirror array with large pixel size and large deflection angle

The paper presents a technological study for the realization of micromirrors which have both, a large pixel size (100 mu m*100 mu m) and a large mirror deflection angle (+or-15 degrees ). This specification requires a 13 mu m gap for electrostatic actuation. A metal surface micromachining process has been developed using thick resist UV- lithography, multiple electroplating, a copper sacrificial layer and a polishing process step. Using nonplanar electrodes the driving voltage of electrostatic actuators can be reduced by factors. Two different technologies to realize tapered electrodes are presented.