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Influence of substrate cleaning on LIDT of 355 nm HR coatings

: Kaiser, N.; Schallenberg, U.B.; Dijon, J.; Garrec, P.


Bennett, H.E.; Guenther, A.H.:
Laser-induced damage in optical materials 1996. Proceedings
Bellingham, Wash.: SPIE, 1997 (SPIE Proceedings Series 2966)
ISBN: 0-8194-2370-X
Symposium on Optical Materials for High-Power Lasers <28, 1996, Boulder/Colo.>
Conference Paper
Fraunhofer IOF ()
Dünne optische Schicht; excimer laser optics; Excimer-Laser-Optik; fluoride thin films; Fluoridschicht; laser induced damage threshold; Laserzerstörschwelle; optical coating; optical thin films; oxide thin films; Oxidschicht; ultraviolet spectral region; ultravioletter Spektralbereich; UV

An advanced high-purity reactive e-beam evaporation process was used to deposit Al2O3/SiO2 HR coatings for 355 nm (Nd: YAG third harmonic) high-power laser applications. Both 1:1 an R:1, 6 ns pulse width, laser-induced damage threshold (LIDT) tests for normal (0 deg) and non-normal (45 deg) incident designs were performed to study the influence of quartz substrate cleaning. Damage test results indicate very high LIDT values on clean substrates. Some tested points have R:1 LIDT above 20 J/cm2. Post-cleaning of coated substrates degrades LIDT.