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  4. Influence of optical nonlinearities of the photoresist on the photolithographic process
 
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1997
Conference Paper
Title

Influence of optical nonlinearities of the photoresist on the photolithographic process

Title Supplement
Basics
Abstract
Several commercial photoresists are characterized with respect to their changes of the real part of the refractive index during the bleaching process. A finite difference beam propagation algorithm is used to evaluate the impact of these refractive index changes on the lithographic process. It is shown, that the refractive index changes result in modified process windows, side wall angles, swing curves and iso/dense behavior.
Author(s)
Erdmann, A.
Henderson, C.L.
Willson, C.G.
Henke, W.
Mainwork
Optical microlithograpy X  
Conference
Society of Photo-Optical Instrumentation Engineers (Conference) 1997  
Language
English
Fraunhofer-Institut für Siliziumtechnologie ISIT  
Keyword(s)
  • finite difference methods

  • optical saturable absorption

  • photoresists

  • refractive index

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