Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.

Influence of In on Si local vibrational modes in InxGa1-xAs -0 equal or smaller than x equal or smaller than 0.12-

Einfluß von In auf die lokalen Schwingungsmoden von Si in InxGa1-xAs -0 gleich oder kleiner als x gleich oder kleiner als 0.12-


Journal of applied physics 76 (1994), No.12, pp.7797-7804 : Abb.,Tab.,Lit.
ISSN: 0021-8979
ISSN: 1089-7550
Journal Article
Fraunhofer IAF ()
local vibrational modes; lokale Schwingungsmode; Si doping; Si-Dotierung

Local vibrational modes (LVM) of Si in substitutional sites have been observed by resonant Raman spectroscopy in highly doped (equal or bigger than 8 x 10 high18 cm high-3)In subx Ga sub1-x As layers, either relaxed or under strain, on (100)GaAs substrates. The peak frequency w subLVM of the Si on Ga site (Si subGa) LVM in unstrained samples shifts to lower values with increasing In content. For x equal or smaller than 0.10 this shift is clearly higher than expected from a linear interpolation between the measured values in the binaries. The comparison between the Si subGa peak frequency measured in both a full strained layer and a relaxed layer with similar composition provides a rough determination of the deformation potentials for the Si subGa LVM in these layers: q/w high2/subLVM = -2.7 plus/minus 1 and p/w high2/subLVM = -2.5 plus/minus 1. As the In content becomes higher the width of the Si subGa peak increases much more than that of the GaAs-like longitudinal optical-phonon peak , revealing the splitting due to the loss of local symmetry introduced by the In. New calibration factors for the Si-defect concentrations have been deduced, which allow estimation of the solubility limit for the Si incorporation in substitutional positions, which ranges from 2.3 x 10 high-19 to 2.6 x 10 high-19 cm high-3 for the layers at the growth conditions used. The analysis of the integrated intensity of the LVM Raman peaks indicates that the degree of electrical compensation is clearly reduced for increasing In up to x equal or smaller than 0.5, due to both an increase of the solubility limit for Si in these layers and a saturation or slight reduction of the Si subAs-related defect concentrations. This conclusion is also supported by Hall and plasmon measurements.