Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.

In situ measurement for resist thickness control and development endpoint detection

 
: Roeder, G.; Ryssel, H.; Temmel, G.

Microelectronic engineering 17 (1992), No.1-4, pp.327-330
ISSN: 0167-9317
International Conference on Microlithography: Microcircuit Engineering (ME) <17, 1991, Rome>
English
Conference Paper
Fraunhofer IIS B ( IISB) ()

: http://publica.fraunhofer.de/documents/PX-18080.html