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In situ layer characterization by spectroscopic ellipsometry at high temperatures

 

Seiler, D.G.; Diebold, C.; Bullis, M.W.; Shaffner, J.; McDonald, R.; Walters, E.J. ; American Institute of Physics -AIP-, New York:
Characterization and metrology for ULSI technology
Woodbury, NY: American Institute of Physics, 1998 (AIP Conference Proceedings 449)
pp.326
International Conference on Characterization and Metrology for ULSI Technology <1998, Gaithersburg/Md.>
English
Conference Paper
Fraunhofer IIS B ( IISB) ()

: http://publica.fraunhofer.de/documents/PX-18079.html