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Identification and removal of opaque defects on X-ray masks in a focussed ion beam repair system

 
: Weigmann, U.; Burghause, H.; Schaffer, H.

Microelectronic engineering 6 (1987), No.1-4, pp.617-622
ISSN: 0167-9317
English
Journal Article
Fraunhofer ISIT ()
focussed ion beam technology; Ionenstrahl(fokussiert); mask repair; Maskenreparatur; Röntgenmaske; X-ray lithography

Abstract
Repair experiments to remove opaque defects on silicon X-ray masks withg electroplated gold absorber features were performed using a 100 keV focussed ion beam system. The quality of the milling process was checked by transferring the repaired mask patterns with X-rays into a resist. The influence of the parameters affecting the repair accuracy such as ion image quality, defect localization, redeposition, milling strategy, and microcrystallites in the electroplated gold absorber on X-ray masks are discussed. (IMT)

: http://publica.fraunhofer.de/documents/PX-17729.html