High sensitivity positive tone X-ray resist: RAY-PF performance under e-beam exposure

The suitability of a newly developed X-ray resist for electron beam lithography has been investigated. RAY-PF is a Novolak-based three component system which uses a catalytic reaction to increase the sensitivity. The resist is found to have a high sensitivity of about 10 mu C/cm2 at 50 keV and a very good contrast ( gamma >4). RAY-PF is found to be suitable for high resolution lithography in the 100 nm range.