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Patent
Title

Harte, amorphe, wasserstofffreie C-Schichten

Other Title
Hard, amorpohous, hydrogen-free C layers and process for their production
Abstract
The invention relates to hard, amorphous, hydrogen-free C layers. The hard, amorpohous carbon layer consists of pure carbon not containing any metal and/or hydrogen (< 0.5 at%) components and is separated by means of pulsed vacuum arc discharge, in particular with laser control, at temperatures of < 100 degrees C. The layer according to the invention has a modulus of elasticity of > 400 G Pa and a hardness of > G Pa, a surface roughness in the range or about 100 nm and it can contain carbon particles which mainly have a lower hardness than the layer itself. The layer according to the invention has an excellent friction/sliding ratio, which is characterized by a friction coefficient of < 0.1 without the use of any lubrication and a friction coefficient of < 0.02 with a reduced use of lubrication, and manifests a high resistance to abrasive wear and corrosion.
Inventor(s)
Scheibe, H.J.
Schultrich, B.
Link to Espacenet
http://worldwide.espacenet.com/publicationDetails/biblio?DB=worldwide.espacenet.com&locale=en_EP&FT=D&CC=DE&NR=19502568A
Patent Number
1995-19502568
Publication Date
2001
Language
German
Fraunhofer-Institut für Werkstoff- und Strahltechnik IWS  
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