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Growth structure investigations of MgF2 and NdF3 films grown by molecular beam deposition on CaF2 (111) substrates



Thin solid films 280 (1996), pp.5-15
ISSN: 0040-6090
Journal Article
Fraunhofer IOF ()
Beschichtungsprozess; deposition process; nanocristalline; Nanokristall; transmission electron microscopy; Transmissionselektronenmikroskopie

The growth structure of MgF2 and NdF3, films grown on polished CaF2(111) substrates deposited by molecular beam deposition has been investigated using transmission electron microscopy (TEM) of microfractographical and surface replications as well as cross-section TEM, atomic force microscopy, packing density, and absorption measurements. It has been shown that by taking advantage of ultrahigh vacuum environments and a special stratification property of MgF2, and NdF3, films, the preparation of nanocrystalline fils of high packing density and low optical absorption is possible at a substrate temperature of 425 K.