• English
  • Deutsch
  • Log In
    Password Login
    Research Outputs
    Fundings & Projects
    Researchers
    Institutes
    Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Artikel
  4. Growth and properties of diamond films prepared by MPCVD using different oxygen-containing source gases
 
  • Details
  • Full
Options
1991
Journal Article
Title

Growth and properties of diamond films prepared by MPCVD using different oxygen-containing source gases

Abstract
The formation of polycrystalline diamond films using activated chemical vapor deposition (CVD) processes is known to be improved by addition of oxygen spezies to the gas phase leading to an enhanced growth rate and a better phase purity of the deposited films. In order to optimize process conditions and to get an insight into the underlying mechanisms, mirowave plasma- activated chemical vapor deposition (MPCVD) of diamond on Si (100) and cemented carbide substrates was performed using carbon monoxide, carbon dioxide and dimethylether as oxygen sources in addition to the commonly used CH sub 4/H sub 2 gas mixture. Admixture of the oxygen source gases allow dianond deposition with enhanced growth rates and better quality compared to the pure CH sub 4/H sub 2 atmosphere. Significant differences concerning the amount of carbon in the gas phase, for which diamond deposition can be achieved, are established. Diamond films produced with CO sub 2 have the lowest nucleation densities and no de position of diamond without addition of CH sub 4 was observed. In contrast to CO sub 2, CH sub 4 additions is not necessary to grow diamond from CO/H sub 2 but small amounts of methane result in considerably increased growth rates. The influences of the source gases on physical film properties like adhesion, strain, and IR transmission of free standing membranes is reported. The results of this study are discussed with regard to film applications and growth mechanisms.
Author(s)
Schäfer, L.
Klages, C.-P.
Journal
Surface and coatings technology  
Conference
European Conference on Diamond and Diamond-like Carbon Coatings 1990  
DOI
10.1016/0257-8972(91)90263-V
Language
English
Fraunhofer-Institut für Schicht- und Oberflächentechnik IST  
Keyword(s)
  • adhesion

  • chemical vapour deposition

  • Diamantfilm

  • diamond films

  • Gasphasenabscheidung

  • growth mechanism

  • Haftung

  • intrinsic film stress

  • Oberflächengenauigkeit

  • Röntgenlithographiemembran

  • Schichtspannung

  • surface roughness

  • Wachstumsmechanismus

  • X-ray lithography

  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Contact
© 2024