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1998
Book Article
Titel
Gas Flow Simulation in a Rapid Thermal Processing System
Alternative
Simulation des Gasstroms in einem Schnellheizsytem
Abstract
Using the simulation software Phoenics-CVD we investigated the temperature distribution on a silicon wafer in a lamp heated rapid thermal processing (RTP) system. A purging gas flow induces a one-sided temperature drop on the wafer. For comparison we performed oxidation experiments using the investigated RTP system. The measured oxid layer thickness distribution showed good agreement with the simulation results.
Language
German
English